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Sputtering Targets

The Thin Film Materials Division is one of the world’s leading producers and developers of sputtering targets for use in the field of thin film technology.
The Division is able to supply targets for all of the key layer systems used in photovoltaic applications. In close co-operation with photovoltaic customers and plant manufacturers the Division has already succeeded in establishing a large number of innovative planar and rotatable targets on the market.
Standards have risen considerably, and most particularly in the thin film photovoltaic industry, from a technical as well as an economical point of view.
The Thin Film Materials Division offers direct solutions to suit the customer. Their ability to convince is based on many years experience of innovation and development, in-depth vertical range production know-how and competent advice on applicational technology.
Targets
Sputtering targets for photovoltaic applications
Material Name Composition [wt%] Purity Rotatable Planar
Ag Silver n.a. 3N7 √ √
Al Aluminum n.a. 4N √ √
CIG Copper Indium Gallium various 4N √ √
CuGa Copper Gallium various 4N * √
CuIn Copper Indium various 4N * √
In Indium n.a. 4N, 5N √ √
ITO Indium Tin Oxide In2O3 / SnO2 10 4N √
Mo Molybdenum n.a. 3N5 √ √
NiV Nickel Vanadium NiV 7 3N √ √
Si Silicon n.a. 5N * √
SISPA® Silicon Aluminum SiAl 10 3N * √
Sn Tin n.a. 3N, 4N √ √
ZAO® (AZO) Zinc Aluminum Oxide ZnO / Al2O3 (0.5 – 2) 3N √ √
ZGO Zinc Gallium Oxide ZnO / Ga2O3 (0.5 – 2.5) 3N √ √
ZnAl Zinc Aluminum ZnAl (0.5 – 2) 3N √ √
i-ZnO Intrinsic Zinc Oxide no doping 3N5 √ √
ZnO 0.01 doped Zinc Oxide doped with 100 ppm 3N5 √ √
ZnO 0.06 doped Zinc Oxide doped with 600 ppm 3N5 √ √
ZnOMgO (ZMO) Zinc Magnesium Oxide ZnO / MgO (15 – 30 at %) 3N √
* materials on request

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